Impedance and morphological properties of electroless gold on industrial metal coupons

被引:16
作者
Sargent, A [1 ]
Sadik, OA [1 ]
机构
[1] SUNY Binghamton, Dept Chem, Binghamton, NY 13902 USA
关键词
D O I
10.1021/la001267e
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
An approach for correlating the bath chemistry during electroless gold deposition with the overall plating quality on industrial wirebond samples is presented. Electrochemical impedance spectroscopy of the reducing agent dimethylamine borane (DMAB) on gold in alkaline solution was used to provide qualitative information on the interfacial adsorption/desorption processes occurring during deposition. Depending on hydroxide and DMAB concentration, impedance data obtained under hydrodynamic conditions at the gold oxide reduction potential (0.184 V vs Ag/AgCl) follow two different equivalent circuit models that do not exhibit contribution from diffusion. Gold deposit quality was assessed with scanning electron microscopy and energy-dispersive spectrometry under a variety of bath compositions. Finally, bath efficiency was evaluated in terms of plating rate obtained from X-ray fluorescence data. The substrate surface/solution interactions are linked to the final quality of the resulting gold layer. This work shows that substrate incompatibility and the ratio imbalance between gold and the reducing agent concentrations produce thin, dull deposits. Maintaining the optimum ratio of DMAB/KOH provides balance in the bath chemistry necessary for efficient plating.
引用
收藏
页码:2760 / 2767
页数:8
相关论文
共 37 条
[1]  
Ali H.O., 1984, Gold Bull, V17, P118, DOI DOI 10.1007/BF03214674
[2]   AN INSITU WEIGHING STUDY OF THE MECHANISM FOR THE FORMATION OF THE ADSORBED OXYGEN MONOLAYER AT A GOLD ELECTRODE [J].
BRUCKENSTEIN, S ;
SHAY, M .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1985, 188 (1-2) :131-136
[3]   OXIDATION OF SOME REDUCING AGENTS USED IN ELECTROLESS PLATING BATHS AT GOLD ANODES IN AQUEOUS-MEDIA [J].
BURKE, LD ;
LEE, BH .
JOURNAL OF APPLIED ELECTROCHEMISTRY, 1992, 22 (01) :48-56
[4]  
CANAPERI DF, 1997, Patent No. 5635253
[5]   IMPEDANCE MEASUREMENTS AND ANALYSIS OF THE CORROSION OF CHROMIUM [J].
DOBBELAAR, JAL ;
DEWIT, JHW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (07) :2038-2046
[6]  
Elder J., 1962, ELECTROCHIM ACTA, V7, P417
[7]  
FRANCESCHETTI DR, 1977, J ELECTROANAL CHEM, V82, P271, DOI 10.1016/0368-1874(77)80339-0
[8]   CURRENT POTENTIAL RELATIONSHIPS FOR THE HALF-REACTIONS IN 2 ELECTROLESS NICKEL PLATING BATHS USING THE QUARTZ CRYSTAL MICROBALANCE ELECTRODE [J].
GAFIN, AH ;
ORCHARD, SW .
JOURNAL OF APPLIED ELECTROCHEMISTRY, 1992, 22 (09) :830-834
[9]   KINETICS OF STEPWISE HYDROLYSIS OF TETRAHYDROBORATE ION [J].
GARDINER, JA ;
COLLAT, JW .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1965, 87 (08) :1692-&
[10]   Autocatalytic gold plating process for electronic packaging applications [J].
Gaudiello, JG .
IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY PART A, 1996, 19 (01) :41-44