Non-uniform SiO2 membranes produced by ion beam-assisted chemical vapor deposition to tune WO3 gas sensor microarrays

被引:21
作者
Goschnick, J [1 ]
Frietsch, M [1 ]
Schneider, T [1 ]
机构
[1] Forschungszentrum Karlsruhe, Inst Analyt Instrumentat, D-76021 Karlsruhe, Germany
关键词
ion beam-assisted chemical vapor deposition; metal oxide gas sensors; microarray; membrane;
D O I
10.1016/S0257-8972(98)00564-7
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Ion beam-assisted chemical vapor deposition (IBAD) has been applied to prepare non-uniform SiO2 layers to adjust the gas selectivity of metal oxide gas sensors integrated in a microarray of 40 WO3 individually addressable gas sensor elements. SiO2 membranes with a thickness gradient in one direction are applied on microarrays to differentiate initially identical sensor elements with respect to their gas response. The analysis with X-ray photoelectron spectroscopy (XPS) and secondary neutral mass spectrometry (SNMS) showed the coating of the microarray by a SiO2 layer with a thickness gradient across the microarray to be successful. The gas-detecting properties were examined by exposing the SiO2-coated microarray to model gas atmospheres. A different gas response for each sensor element was obtained due to the non-uniform SiO2 coating resulting in decisive conductivity patterns of the microarray to be used for gas recognition. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:292 / 296
页数:5
相关论文
共 11 条
[1]   Multisensor microsystem for contaminants in air [J].
Althainz, P ;
Goschnick, J ;
Ehrmann, S ;
Ache, HJ .
SENSORS AND ACTUATORS B-CHEMICAL, 1996, 33 (1-3) :72-76
[2]  
ALTHAINZ P, 1995, SENSOR ACTUAT B-CHEM, V24, P366
[3]  
DAHLKE A, 1996, THESIS U KARLSRUHE
[4]  
EHRMANN S, 1997, THESIS TU KARLSRUHE
[5]  
EHRMANN S, 1998, IN PRESS P 7 INT M C
[6]  
GOSCHNICK J, 1998, P 25 INT C MET COAT
[7]   ION-BEAM-INDUCED CHEMICAL-VAPOR-DEPOSITION FOR THE PREPARATION OF THIN-FILM OXIDES [J].
LEINEN, D ;
FERNANDEZ, A ;
ESPINOS, JP ;
BELDERRAIN, TR ;
GONZALEZELIPE, AR .
THIN SOLID FILMS, 1994, 241 (1-2) :198-201
[8]  
Moulder J.F., 1995, HDB XRAY PHOTOELECTR
[9]  
OECHSNER H, 1984, THIN FILMS DEPTH PRO, V34, P148
[10]  
SCHUTT G, 1997, 5924 FZKA U KARLSR T