Investigation on the structure of TiO2 films sputtered on alloy substrates

被引：17

作者：

Gu, GR

Li, YA

Tao, YC

He, Z

Li, JJ

Yin, H

Li, WQ

Zhao, YN ^{[1
]}

机构：

[1] Jilin Univ, Natl Key Lab Superhard Mat, Changchun 130023, Jilin, Peoples R China

[2] Yanbian Univ, Coll Sci & Engn, Yanji 133002, Jilin, Peoples R China

[3] Jilin Univ, Key Lab Supermol Struct & Spect, Changchun 130023, Jilin, Peoples R China

来源：

VACUUM | 2003年 / 71卷 / 04期

关键词：

TiO2; films; phase transition; Raman spectra; X-ray diffraction;

D O I：

10.1016/S0042-207X(03)00048-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium dioxide (TiO2) films have been successfully deposited on metal alloy substrates by radio-frequency magnetron reactive sputtering in an Ar + O-2 gas mixture. The effects of gas total pressure on the structure and phase transition of TiO2 films were studied by X-ray diffraction and Raman spectra. It is suggested that the film structure changes from rutile to anatase while work gas total pressure changes from 0.2 to 2 Pa. The structure of TiO2 films is not affected by the film thickness. (C) 2003 Elsevier Science Ltd. All rights reserved.

引用

页码：487 / 490

页数：4

共 16 条

[1] COMPARATIVE-STUDY OF TITANIUM-DIOXIDE THIN-FILMS PRODUCED BY ELECTRON-BEAM EVAPORATION AND BY REACTIVE LOW-VOLTAGE ION PLATING [J].