Selective site occupancy exhibited by Cr3+ and Cr6+ incorporated into electrochemically deposited nickel hydroxide films

被引：11

作者：

Balasubramanian, M ^{[1
]}

Melendres, CA ^{[1
]}

机构：

[1] Argonne Natl Lab, Div Chem Technol, Argonne, IL 60439 USA

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 1999年 / 2卷 / 04期

关键词：

D O I：

10.1149/1.1390771

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

We have utilized extended X-ray absorption fine structure (EXAFS) spectroscopy to investigate the site occupancy and local structure of Cr3+ and Cr6+ ions incorporated into electrodeposited alpha-Ni(OH)(2) films. The films were prepared by codeposition of Cr and Ni at constant cathodic current from aqueous solutions of nickel nitrate, chromium nitrate, and potassium chromate. EXAFS measurements show that in films produced from Ni2+ and Cr3+ solution, Cr3+ is incorporated into Ni lattice sites in alpha-Ni(OH)(2). On the other hand, cathodic codeposition of Cr6+ and Ni2+ results in CrO42- in interlamellar sites as well as sorbed on the surface of alpha-Ni(OH)(2). These results are of significance in a number of technological areas, e.g., batteries, corrosion protection, environmental speciation, and remediation. (C) 1999 The Electrochemical Society. S1099-0062(98)06-015-5. All rights reserved.

引用

页码：167 / 169

页数：3

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