Carbon nitride films incorporated with metal by rf plasma enhanced chemical vapor deposition

Carbon-based coatings alloyed with metal elements by using various routes had been reported. This encouraged a study on the effect of metal alloying on the carbon nitride films deposited bg using plasma-enhanced chemical vapor deposition (PECVD) which has some advantages over the other plasma-assisted processes. The sputtering phenomenon occurring on rf electrode enables the incorporation of metal to carbon nitride films. An attempt is to reveal microstructure and mechanical properties of the films deposited by using this synergetic process with N-2-CH4-H-2 premixed gas as precursors. Chromium, iron, 304 stainless steel and graphite were chosen as rf electrode materials. Experimental results show that carbon nitride films composed of amorphous matrix and microcrystalline beta-C3N4 were deposited by using PECVD. Metal content of the deposited films linearly increases as the N-2 gas fraction is increased, with a rate depending on the rf electrode material used. This highlights the sputtering effect of ionized N-2 gas. The incorporated metals display in forms of oxide, carbide and amorphous matrix, which result in a change in microstructure and wear behavior. Chromium induces an adhesion wear and exhibits the highest friction coefficient. yet has the lowest wear rate. (C) 1998 Elsevier Science S.A.