Effect of two types of surface sites on the characteristics of Si3N4-gate pH-ISFETs

被引:68
作者
Niu, MN [1 ]
Ding, XF [1 ]
Tong, QY [1 ]
机构
[1] SOUTHEAST UNIV,CTR MICROELECT,NANJING 210096,PEOPLES R CHINA
关键词
pH-ISFETs; Si3N4; films; site-binding model; ratio of silanol to amine sites; sensing characteristics;
D O I
10.1016/S0925-4005(97)80067-6
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Based on the site-binding model, the effects of two types of surface sites (namely, silanol sites and amine sites) and their ratio on the characteristics of an Si3N4-gate pH-ISFET are discussed. As the ratio beta of silanol sites to amine sites is about 7/3, the maximum of sensitivity of the electrolyte-insulator (E-I) interfacial potential versus the pH value, as well as of the range of linear response are theoretically obtained. The stability of pH-ISFET devices is partially determined by the total number of the two types of surface sites and their ratio. The theoretical results are shown to be supported by experimental results.
引用
收藏
页码:13 / 17
页数:5
相关论文
共 10 条
[1]   OPERATION OF CHEMICALLY SENSITIVE FIELD-EFFECT SENSORS AS A FUNCTION OF THE INSULATOR-ELECTROLYTE INTERFACE [J].
BOUSSE, L ;
DEROOIJ, NF ;
BERGVELD, P .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (10) :1263-1270
[2]   EFFECT OF TOTAL HYDROGEN CONTENT IN SILICON-NITRIDE SENSITIVE FILM ON PERFORMANCE OF ISFET [J].
CHEN, KM ;
LI, GH ;
LU, HY ;
CHEN, LX .
SENSORS AND ACTUATORS B-CHEMICAL, 1993, 12 (01) :23-27
[3]   IMPROVEMENT OF STRUCTURAL INSTABILITY OF THE ION-SENSITIVE FIELD-EFFECT TRANSISTOR (ISFET) [J].
CHEN, KM ;
LI, GH ;
CHEN, LX ;
ZHU, Y .
SENSORS AND ACTUATORS B-CHEMICAL, 1993, 13 (1-3) :209-211
[4]   A GENERALIZED THEORY OF AN "ELECTROLYTE-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR [J].
FUNG, CD ;
CHEUNG, PW ;
KO, WH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (01) :8-18
[5]   MODELING H+-SENSITIVE FETS WITH SPICE [J].
GRATTAROLA, M ;
MASSOBRIO, G ;
MARTINOIA, S .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (04) :813-819
[6]   ION-SENSING DEVICES WITH SILICON-NITRIDE AND BOROSILICATE GLASS INSULATORS [J].
HARAME, DL ;
BOUSSE, LJ ;
SHOTT, JD ;
MEINDL, JD .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (08) :1700-1707
[7]  
LEVINE S, 1971, DISCUSS FARADAY SOC, V52, P290
[8]   METHODS OF ISFET FABRICATION [J].
MATSUO, T ;
ESASHI, M .
SENSORS AND ACTUATORS, 1981, 1 (01) :77-96
[9]  
Niu Wencheng, 1993, Chinese Journal of Semiconductors, V14, P313
[10]   SITE-BINDING MODEL OF ELECTRICAL DOUBLE-LAYER AT OXIDE-WATER INTERFACE [J].
YATES, DE ;
LEVINE, S ;
HEALY, TW .
JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS I, 1974, 70 :1807-1818