Marangoni effects on evaporative lithographic patterning of colloidal films

被引：74

作者：

Harris, Daniel J. ^{[1
,2
]}

Lewis, Jennifer A. ^{[1
,2
]}

机构：

[1] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA

[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA

来源：

LANGMUIR | 2008年 / 24卷 / 08期

关键词：

D O I：

10.1021/la8000637

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We investigate the effects of Marangoni stresses on the evaporative lithographic patterning of colloidal films (Harris, D. J.; Hu, H.; Conrad, J. C.; Lewis, J. A. Phys. Rev. Lett. 2007, 98 (14), 148301). Films are dried beneath a mask that induces periodically varying regions of free and hindered evaporation. Direct imaging reveals that silica microspheres suspended within an organic solvent exhibit recirculating flows induced by temperature and surface tension gradients that arise during drying. The films display remarkable pattern formation with a majority of the particles deposited in the masked regions. Above a critical colloid volume fraction, recirculating flows are suppressed, leading to particle deposition in unmasked regions of high evaporative flux.

引用

页码：3681 / 3685

页数：5

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