Deep-level transient spectroscopy of the Ge-vacancy pair in Ge-doped n-type silicon

被引:36
作者
Budtz-Jorgensen, CV [1 ]
Kringhoj, P
Larsen, AN
Abrosimov, NV
机构
[1] Aarhus Univ, Inst Phys & Astron, DK-8000 Aarhus C, Denmark
[2] Inst Crystal Growth, D-12489 Berlin, Germany
[3] Russian Acad Sci, Inst Solid State Phys, Chernogolovka 142432, Russia
来源
PHYSICAL REVIEW B | 1998年 / 58卷 / 03期
关键词
D O I
10.1103/PhysRevB.58.1110
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Proton-irradiation induced defects in Ge-containing, n-type Si, either grown by molecular-beam epitaxy or by the Czochralski technique, have been studied by on-line deep-level transient spectroscopy (DLTS) after low-temperature irradiations. A level associated to the Ge-V pair has been unambigously identified with an activation enthalpy of 0.29 eV relative to the conduction band. It is argued that this level is most probably the (=/-) level of the Ge-V pair. A DLTS line correlated to a possible (-/0) level is not observed. [S0163-1829(98)00427-5].
引用
收藏
页码:1110 / 1113
页数:4
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