Evolution of surface waviness in thin films via volume and surface diffusion

被引:48
作者
Panat, R
Hsia, KJ
Cahill, DG
机构
[1] Univ Illinois, Dept Theoret & Appl Mech, Urbana, IL 61801 USA
[2] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
[3] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
关键词
D O I
10.1063/1.1827920
中图分类号
O59 [应用物理学];
学科分类号
摘要
Deformation mechanisms involving mass transport by stress driven diffusion influence a large number of technological problems. We study the formation of undulations on surfaces of stressed films at high temperature by exploring the deformation kinetics governed by volume and surface diffusion. A governing equation is derived that gives the amplitude change of such surfaces as a function of time. A parametric study is then carried out using a range of practically important input values of the film material properties. The results show that at the dominant instability wavelength, under high average stresses (giga pascal range), only surface diffusion contributes to film surface morphology evolution whereas under low stress and high-temperature conditions, both surface diffusion and volume diffusion contribute to film surface morphology evolution. Furthermore, the contribution of volume diffusion depends on the sign of the film stress, with compressive stress promoting surface roughening and tensile stress promoting surface smoothing. (C) 2005 American Institute of Physics.
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页数:7
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