Electrolytic deposition of niobium oxide films

被引：37

作者：

Zhitomirsky, I ^{[1
]}

机构：

[1] Technion Israel Inst Technol, Israel Inst Met, IL-32000 Haifa, Israel

来源：

MATERIALS LETTERS | 1998年 / 35卷 / 3-4期

关键词：

electrodeposition; niobium oxide; deposit; gel; hydrogen peroxide; film;

D O I：

10.1016/S0167-577X(97)00248-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Cathodic electrolytic deposition of Nb2O5 films on platinum substrates was performed via hydrolysis by use of an electrogenerated base of the NbCl5 salt dissolved in water in the presence of hydrogen peroxide. The deposits were characterized by XRD, TG/DTA, SEM and Auger methods. The crystallization behavior of the deposits and precipitated gels was compared. A possible mechanism of electrodeposition is discussed. (C) 1998 Elsevier Science B.V. All rights reserved.

引用

页码：188 / 193

页数：6

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