Hierarchical self-assembly of block copolymers for lithography-free nanopatterning
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Kim, Bong Hoon
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South Korea
Kim, Bong Hoon
[1
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Shin, Dong Ok
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South Korea
Shin, Dong Ok
[1
]
Jeong, Seong-Jun
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South Korea
Jeong, Seong-Jun
[1
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Koo, Chong Min
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Korea Inst Sci & Technol, Hybrid Mat Res Ctr, Seoul, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South Korea
Koo, Chong Min
[2
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Jeon, Sang Chul
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Natl Nanofab Ctr NNFC, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South Korea
Jeon, Sang Chul
[3
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Hwang, Wook Jung
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Natl Nanofab Ctr NNFC, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South Korea
Hwang, Wook Jung
[3
]
Lee, Sumi
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Samsung Adv Inst Technol, Yongin 446712, Gyunggi Do, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South Korea
Lee, Sumi
[4
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Lee, Moon Gyu
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Samsung Adv Inst Technol, Yongin 446712, Gyunggi Do, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South Korea
Lee, Moon Gyu
[4
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Kim, Sang Ouk
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South Korea
Kim, Sang Ouk
[1
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机构:
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Inst Nanocentury, Taejon 305701, South Korea
[2] Korea Inst Sci & Technol, Hybrid Mat Res Ctr, Seoul, South Korea
[3] Natl Nanofab Ctr NNFC, Taejon 305701, South Korea
[4] Samsung Adv Inst Technol, Yongin 446712, Gyunggi Do, South Korea
Hierarchical self-assembly of block copolymers has been achieved by two steps of sequential ordering processes, consisting of self-organized micropatterning from a dewetting block polymer solution and thermal annealing. The self-organized micropattern induces the spontaneous alignment of self-assembled lamellae (see figure), which is successfully applied for a lithography-free, ultra-large-scale nanopatterning.