Epitaxial growth and chemical lift-off of GaInN/GaN heterostructures on c- and r-sapphire substrates employing ZnO sacrificial templates

被引:21
作者
Liu, H. F. [1 ]
Liu, W. [1 ]
Chua, S. J. [1 ]
机构
[1] Agcy Sci Technol & Res, Inst Mat Res & Engn, Singapore 117602, Singapore
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2010年 / 28卷 / 04期
关键词
VAPOR-PHASE EPITAXY; X-RAY-DIFFRACTION; LIGHT-EMITTING-DIODES; GAN; FILMS;
D O I
10.1116/1.3443220
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The authors report epitaxial growth of GaInN/GaN heterostructures on ZnO/ c-sapphire and ZnO/ r-sapphire substrates by using metal-organic chemical-vapor deposition and chemical lift-off by etching away the ZnO templates. Using a black-wax technique and a vapor wax-elimination method, they demonstrate a 10 X 10 mm(2) crack-free lift-off of GaInN/GaN from the c-sapphire substrate followed by bonding to a glass holder. On the ZnO/r-sapphire substrate, with the same lift-off processing, the GaInN/GaN was regularly cracked along its c-axis and the cracking is independent of the etching rate (controlled by the solution density). The cracking mechanism is investigated and discussed based on the x-ray diffraction and Raman-scattering characterizations before and after lift-off. (c) 2010 American Vacuum Society. [DOI: 10.1116/1.3443220]
引用
收藏
页码:590 / 594
页数:5
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