Plasma reactivity and plasma-surface interactions during treatment of toluene by a dielectric barrier discharge

被引：80

作者：

Blin-Simiand, N. ^{[1
]}

Jorand, F. ^{[1
]}

Magne, L. ^{[1
]}

Pasquiers, S. ^{[1
]}

Postel, C. ^{[1
]}

Vacher, J. -R. ^{[1
]}

机构：

[1] Univ Paris 11, Lab Phys Gaz & Plasmas, CNRS, UMR8578, F-91405 Orsay, France

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 2008年 / 28卷 / 04期

关键词：

dielectric barrier discharge; toluene; plasma kinetic; ozone; oxygen atom; hydroxyl radical;

D O I：

10.1007/s11090-008-9135-1

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Toluene removal is investigated in filamentary plasmas produced in N-2 and in N-2/O-2 mixtures by a pulse high voltage energised DBD. Influence of the oxygen percentage (lower than 10%) and of the temperature (lower than 350C) is examined. Toluene is removed in N-2 through collisions with electrons and nitrogen excited states. The removal efficiency is a few higher in N-2/O-2. It increases when the temperature increases for N-2 and N-2/O-2. Both H- and O-atoms play an important role in toluene removal because H can readily recombine with O to form OH, which is much more reactive with toluene than O. H follows from dissociation of toluene and of hydrogenated by-products by electron collisions. Detection of cyanhidric acid, acetylene, formaldehyde, and methyl nitrate strengthens that dissociation processes, to produce H and CH3, must be taken into account in kinetic analysis. Formation and treatment of deposits are also analysed.

引用

页码：429 / 466

页数：38

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