Thin film deposition of organic-inorganic hybrid materials using a single source thermal ablation technique

被引：175

作者：

Mitzi, DB ^{[1
]}

Prikas, MT ^{[1
]}

Chondroudis, K ^{[1
]}

机构：

[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Heights, NY 10598 USA

来源：

CHEMISTRY OF MATERIALS | 1999年 / 11卷 / 03期

关键词：

D O I：

10.1021/cm9811139

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A versatile single source thermal ablation (SSTA) technique is demonstrated, enabling the deposition of high-quality films of organic-inorganic hybrid materials. The SSTA process involves rapidly heating the organic-inorganic compound using a resistively heated sheet. The organic and inorganic components ablate from the heater at effectively the same time, without decomposition, and the components reassemble on a substrate to form crystalline films of the original hybrid.

引用

页码：542 / +

页数：4

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