Effect of temperature on the decomposition of trifluoromethane in a dielectric barrier discharge reactor

被引:16
作者
Kim, D. -H. [1 ]
Mok, Y. S. [1 ]
Lee, S. B. [1 ]
机构
[1] Cheju Natl Univ, Dept Chem Engn, Cheju 690756, South Korea
关键词
Nonthermal plasma; Ttrifluoromethane; Dielectric barrier discharge; Semiconductor processing gas; PACKED-BED REACTOR; PLASMA; C2F6; GAS; DESTRUCTION; REMOVAL;
D O I
10.1016/j.tsf.2010.11.060
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This study investigated the decomposition of trifluoromethane (HFC-23) by using nonthermal plasma (NTP) generated in a dielectric barrier discharge (DBD) reactor. The main problem of the NTP process may be its low decomposition efficiency for fluorinated carbons, which can be resolved by introducing a catalyst and operating the process at elevated temperatures. The effect of temperature on the HFC-23 decomposition was examined with alumina or glass beads as the packing material in the NTP reactor. With other conditions kept constant, higher temperature resulted in higher HFC-23 decomposition efficiency, and it was shown that the NTP reactor packed with alumina beads acting as a catalyst decomposed HFC-23 more effectively than that with glass beads. When the reactor temperatures were 300 degrees C and 250 degrees C (flow rate: 60 L h(-1); HFC-23 concentration: 2000 ppm), the decomposition efficiency in the presence of the alumina catalyst approached 100% at input powers of 60W and 100W, respectively. The main products from HFC-23 were CO and CO(2), which nearly accounted for the amount of HFC-23 decomposed. With respect to the decomposition efficiency, the combination of the NTP and the catalyst was more advantageous than using them separately. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:6960 / 6963
页数:4
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