Deposition of DLC films in CH4/Ne and CH4/Kr rf plasmas

被引:8
作者
Mutsukura, N
Yoshida, K
机构
关键词
DLC films; CH4; plasmas; mechanical hardness;
D O I
10.1016/S0925-9635(96)00641-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The deposition of a hydrogenated diamond-like carbon (DLC) film and plasma diagnostics were carried out in 13.56 MHz r.f. CH4/Ne and CH4/Kr plasmas. The mechanical and optical properties of the deposited DLC films were examined with respect to the source gas composition ratio. The film deposition rates, depending on the CH4 content of the plasmas, indicated almost the same behavior. On the other hand, the mechanical hardness of the films was different; it slightly increased with decreasing CH4 content in CH4/Ne plasma, whereas it decreased monotonically in CH4/Kr plasma. This result is consistent with the IR absorption spectra of the films. Mass spectrometry measurements of the plasma were carried out, and the ionic species reaching the electrode were determined. The Ne and Kr admixtures enhanced hydrocarbon ion densities in both plasmas via deexcitation processes. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:547 / 550
页数:4
相关论文
共 13 条
[1]   PRODUCT DISTRIBUTIONS IN THE REACTIONS OF EXCITED NOBLE-GAS ATOMS WITH HYDROGEN-CONTAINING COMPOUNDS [J].
BALAMUTA, J ;
GOLDE, MF ;
HO, YS .
JOURNAL OF CHEMICAL PHYSICS, 1983, 79 (06) :2822-2830
[2]   BONDING IN HYDROGENATED HARD CARBON STUDIED BY OPTICAL SPECTROSCOPY [J].
DISCHLER, B ;
BUBENZER, A ;
KOIDL, P .
SOLID STATE COMMUNICATIONS, 1983, 48 (02) :105-108
[3]  
GILES K, 1989, J PHYS B ATOM MOL PH, V22, P1865
[4]  
LANDENSLAGER JB, 1974, J CHEM PHYS, V61, P4600
[6]   Temperature dependence of a-C:H film deposition in a CH4 radio frequency plasma [J].
Mutsukura, N ;
Saitoh, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (04) :2666-2668
[7]   Deposition of DLC films in CH4/Ar and CH4/Xe rf plasmas [J].
Mutsukura, N ;
Yoshida, K .
DIAMOND AND RELATED MATERIALS, 1996, 5 (09) :919-922
[8]   DEPOSITION OF DIAMOND-LIKE CARBON-FILM IN CH4-HE RF PLASMA [J].
MUTSUKURA, N ;
MIYATANI, K .
DIAMOND AND RELATED MATERIALS, 1995, 4 (04) :342-345
[9]   DIAGNOSTICS AND CONTROL OF RADIOFREQUENCY GLOW-DISCHARGE [J].
MUTSUKURA, N ;
FUKASAWA, Y ;
MACHI, Y ;
KUBOTA, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (06) :3126-3130
[10]   DIAGNOSTIC EXPERIMENT AND KINETIC-MODEL ANALYSIS OF MICROWAVE CH4/H-2 PLASMAS FOR DEPOSITION OF DIAMOND-LIKE CARBON-FILMS [J].
TAHARA, H ;
MINAMI, K ;
MURAI, A ;
YASUI, T ;
YOSHIKAWA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (4A) :1972-1979