Electrical transport characteristics of Au/n-GaAs Schottky diodes on n-Ge at low temperatures

被引:166
作者
Hudait, MK
Venkateswarlu, P
Krupanidhi, SB
机构
[1] Indian Inst Sci, Mat Res Ctr, Bangalore 560012, Karnataka, India
[2] ISRO, Satellite Ctr, Solar Panels Div, Bangalore 560017, Karnataka, India
关键词
GaAS; Schottky diodes; MOVPE; Ge;
D O I
10.1016/S0038-1101(00)00230-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The current-voltage characteristics of Au/n-GaAs Schottky diodes grown by metal-organic vapor-phase epitaxy on Ge substrates were determined in the temperature range 80-300 K. The zero-bias barrier height for current transport decreases and the ideality factor increases at low temperatures. The ideality factor was found to show the T-o effect and a higher characteristic energy. The excellent matching between the homogeneous barrier height and the effective barrier height was observed and infer good quality of the GaAs him. No generation-recombination current due to deep levels arising during the GaAs/Ge heteroepitaxy was observed in this study, The value of the Richardson constant was found to be 7.04 A K-2 cm(-2), which is close to the value used for the determination of the zero-bias barrier height. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:133 / 141
页数:9
相关论文
共 36 条
[1]   ELECTRICAL CHARACTERISTICS OF GAAS MIS SCHOTTKY DIODES [J].
ASHOK, S ;
BORREGO, JM ;
GUTMANN, RJ .
SOLID-STATE ELECTRONICS, 1979, 22 (07) :621-631
[2]   A NEW RICHARDSON PLOT FOR NON-IDEAL SCHOTTKY DIODES [J].
BHUIYAN, AS ;
MARTINEZ, A ;
ESTEVE, D .
THIN SOLID FILMS, 1988, 161 :93-100
[3]  
BORREGO M, 1977, APPL PHYS LETT, V30, P1669
[4]   GAAS-ON-SI - IMPROVED GROWTH-CONDITIONS, PROPERTIES OF UNDOPED GAAS, HIGH MOBILITY, AND FABRICATION OF HIGH-PERFORMANCE ALGAAS GAAS SELECTIVELY DOPED HETEROSTRUCTURE TRANSISTORS AND RING OSCILLATORS [J].
CHAND, N ;
REN, F ;
MACRANDER, AT ;
VANDERZIEL, JP ;
SERGENT, AM ;
HULL, R ;
CHU, SNG ;
CHEN, YK ;
LANG, DV .
JOURNAL OF APPLIED PHYSICS, 1990, 67 (05) :2343-2353
[5]   Effects of barrier height distribution on the behavior of a Schottky diode [J].
Chand, S ;
Kumar, J .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (10) :5005-5010
[6]   Current transport in Pd2Si/n-Si(100) Schottky barrier diodes at low temperatures [J].
Chand, S ;
Kumar, J .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1996, 63 (02) :171-178
[7]   EXTRACTION OF SCHOTTKY DIODE PARAMETERS FROM FORWARD CURRENT-VOLTAGE CHARACTERISTICS [J].
CHEUNG, SK ;
CHEUNG, NW .
APPLIED PHYSICS LETTERS, 1986, 49 (02) :85-87
[8]   GALLIUM-ARSENIDE AND OTHER COMPOUND SEMICONDUCTORS ON SILICON [J].
FANG, SF ;
ADOMI, K ;
IYER, S ;
MORKOC, H ;
ZABEL, H ;
CHOI, C ;
OTSUKA, N .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (07) :R31-R58
[9]   ELECTRICAL PROPERTIES OF NICKEL-LOW-DOPED N-TYPE GALLIUM-ARSENIDE SCHOTTKY-BARRIER DIODES [J].
HACKAM, R ;
HARROP, P .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (12) :1231-+
[10]   CURRENT-VOLTAGE CHARACTERISTIC OF TI-PSI METAL-OXIDE-SEMICONDUCTOR DIODES [J].
HANSELAER, PL ;
LAFLERE, WH ;
VANMEIRHAEGHE, RL ;
CARDON, F .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (08) :2309-2314