Wavelength-selective addressing of visible and near-infrared plasmon resonances for SU8 nanolithography

被引：12

作者：

de Hoogh, Anouk ^{[1
]}

Hommersom, Bob ^{[1
]}

Koenderink, A. Femius ^{[1
]}

机构：

[1] FOM Inst Atom & Mol Phys AMOLF, Ctr Nanophoton, NL-1098 XG Amsterdam, Netherlands

来源：

OPTICS EXPRESS | 2011年 / 19卷 / 12期

关键词：

FIELD; ARRAYS; NANOSTRUCTURES; POLYMERIZATION; METAMATERIALS; NANOANTENNAS; NANOSCALE; OPTICS;

D O I：

10.1364/OE.19.011405

中图分类号：

O43 [光学];

学科分类号：

070207 [光学];

摘要：

We imprint plasmonic near field enhancements as nanoscale topography in SU8 photoresist using two-photon absorption from a spectrally filtered broadband supercontinuum light source. Imprinted patterns smaller than 50 nm across are obtained localized at positions of high local field enhancements in gold bow tie antennas, and gold split rings resonant in the visible and near-infrared. Enhanced exposure only occurs at wavelengths and polarizations that exactly match the plasmonic resonances. Hence our work demonstrates that wavelength selective addressing of hot spots for nanolithography using an inexpensive, low peak-power picosecond pulsed source is freely tunable throughout the visible and infrared to match any desired plasmon resonance. (C) 2011 Optical Society of America

引用

页码：11405 / 11414

页数：10

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