Effects of microstructure on optical properties of Ge2Sb2Te5 thin films

被引：7

作者：

Kim, JH ^{[1
]}

Kim, MR ^{[1
]}

机构：

[1] LG Corp Inst Technol, Devices & Mat Lab, Seoul 137724, South Korea

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 4B期

关键词：

phase-change; amorphous; crystalline; sputtering; thin film; optical property;

D O I：

10.1143/JJAP.37.2116

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effects of thin film microstructure on the optical properties of Ge2Sb2Te5 recording medium and their wavelength dependence were investigated. The microstructure of thin films was modified by changing sputtering Ar gas pressure during sample preparation. The variations in microstructure and film density were examined for samples prepared at various Ar gas pressures. The optical properties were dependent on the sputtering gas pressure and could be correlated with the film microstructure.

引用

页码：2116 / 2117

页数：2

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