Influence of ambient medium on feratosecond laser processing of silicon

被引:72
作者
Besner, S [1 ]
Degorce, JY [1 ]
Kabashin, A [1 ]
Meunier, M [1 ]
机构
[1] Ecole Polytech, Dept Engn Phys, Laser Proc Lab, Montreal, PQ H3C 3A7, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
femtosecond laser ablation in liquid; crater characteristics; silicon;
D O I
10.1016/j.apsusc.2005.01.137
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Femtosecond laser radiation (800 nm, 250 fs, 1 mJ/pulse) has been used to treat a Si surface in different ambient environments, namely vacuum, air and water. We show that ablation threshold and crater characteristics (diameter "D" and shape of craters) are similar for the three media at low laser fluences, suggesting an identical radiation-related mechanism of material removal. In contrast, at high fluences the characteristic dependence of the crater size D 2 (F) in the semi-logarithmic scale becomes non-linear, starting from F = 10, 4 and 2 J/cm(2) for vacuum, air and water, respectively, while the shape of craters becomes different for these media. The non-linear phenomena are ascribed to plasma-related ablation effects. Possible mechanisms of material removal are discussed. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:163 / 168
页数:6
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