Ion flux and deposition rate measurements in the RF continuous wave plasma polymerisation of acrylic acid

被引：18

作者：

Beck, AJ

France, RM

Leeson, AM

Short, RD ^{[1
]}

Goodyear, A

Braithwaite, NS

机构：

[1] Univ Sheffield, Dept Mat Engn, Lab Phys & Interface Anal, Sheffield S1 3JD, S Yorkshire, England

[2] Open Univ, Oxford Res Unit, Oxford OX1 5HR, England

来源：

CHEMICAL COMMUNICATIONS | 1998年 / 11期

关键词：

D O I：

10.1039/a801778f

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Ion flux and deposition rate measurements made in plasmas of acrylic acid support the view that at low plasma power ions are primarily responsible for deposit growth.

引用

页码：1221 / 1222

页数：2

共 8 条

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OTOOLE, L
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AMEEN, AP
JONES, FR
[J]. JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS, 1995, (10) : 1053 - 1054
[3] GRILL A, 1993, COLD PLASMAS MAT FAB, P186
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BECK, AJ
AMEEN, AP
JONES, FR
SHORT, RD
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[5] An investigation of the mechanisms of plasma polymerisation of allyl alcohol
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[J]. JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS, 1997, 93 (06): : 1141 - 1145
[6] MASS-SPECTROMETRY OF AND DEPOSITION-RATE MEASUREMENTS FROM RADIOFREQUENCY-INDUCED PLASMAS OF METHYL ISOBUTYRATE, METHYL-METHACRYLATE AND N-BUTYL METHACRYLATE
OTOOLE, L
SHORT, RD
AMEEN, AP
JONES, FR
[J]. JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS, 1995, 91 (09): : 1363 - 1370
[7] St Braithwaite N. J., 1996, PLASMA SOURCES SCI T, V5, P677
[8] Yasuda H., 1985, PLASMA POLYM

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