The influence of deposition parameters on room temperature ozone sensing properties of InOx films

被引：108

作者：

Gagaoudakis, E ^{[1
]}

Bender, M ^{[1
]}

Douloufakis, E ^{[1
]}

Katsarakis, N ^{[1
]}

Natsakou, E ^{[1
]}

Cimalla, V ^{[1
]}

Kiriakidis, G ^{[1
]}

机构：

[1] Fdn Res & Technol Hellas, Mat Grp, Inst Elect Struct & Laser, Iraklion 71110, Crete, Greece

来源：

SENSORS AND ACTUATORS B-CHEMICAL | 2001年 / 80卷 / 02期

关键词：

dc magnetron sputtering; indium oxide thin films; ozone sensor at room temperature;

D O I：

10.1016/S0925-4005(01)00908-X

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

Indium oxide films with a thickness of 100 nm were deposited onto Coming 7059 glass substrates at room temperature. The films were prepared by the dc magnetron sputtering technique using a variety of sputtering powers and sputtering atmospheres. The structural parameters of the films as determined by XRD analysis and the optical band gap were found to be dependent on the sputtering power during their preparation. The ozone sensing properties of the indium oxide films were investigated following an activation with UV light and as a result a sensitivity of 10(5) to 10(6) was achieved. For films sputtered with a deposition rate of 0.4 Angstrom /s and with 100% oxygen in plasma during the sputtering process, the highest sensitivity was achieved. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：155 / 161

页数：7

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