Physical properties of (La,Sr)Ti(O,N)3 thin films grown by pulsed laser deposition

被引：16

作者：

Aguiar, Rosiana ^{[1
]}

Logvinovich, Dmitry ^{[2
]}

Weidenkaff, Anke ^{[2
]}

Karl, Helmut ^{[3
]}

Schneider, Christof W. ^{[3
]}

Reller, Armin ^{[1
]}

Ebbinghaus, Stefan G. ^{[1
]}

机构：

[1] Univ Augsburg, Inst Phys, D-86159 Augsburg, Germany

[2] Swiss Fed Labs Mat Testing & Res, Empa, CH-8600 Dubendorf, Switzerland

[3] Univ Augsburg, Inst Phys, D-86159 Augsburg, Germany

来源：

MATERIALS RESEARCH BULLETIN | 2008年 / 43卷 / 06期

关键词：

thin films; epitaxial growth; laser deposition; electrical properties;

D O I：

10.1016/j.materresbull.2007.06.049

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of LaxSr1-xTiO3+x/2 (x = 0, 0.25, 0.5, 0.75, 1) were grown by laser ablation on two different kinds of substrates (SrTiO3 (STO) and MgO) and weir subsequently ammonolysed to yield the corresponding oxynitrides LaxSr1-xTi(O,N)(3). For both substrates all films were found to grow epitaxially to the (100) direction of the cubic perovskite structure, except for x = 0.5 that grew parallel to the (110) direction. For some of the films TiN was detected as impurity phase. Scanning electron microscopy revealed that the films are dense and homogeneous with thicknesses around 350 nm. Atomic force microscopy showed that the surface roughness of the films varied between 4.2 and 14.1 nm. The employed substrate had a strong influence on the electrical properties. Films grown on STO exhibited a metallic behaviour, in contrast to the films grown on MgO, which were insulating. (C) 2007 Elsevier Ltd. All rights reserved.

引用

页码：1376 / 1383

页数：8

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