Characterization and application of a UV-based imprint technique

We have investigated a UV-based nanoimprint technique with regard to its potential for large area applications. One aspect is the investigation of the residual resist thickness h(r), which depends on the geometry of the mold. If the geometry of structures to be printed varies strongly across the mold, fluctuations of the residual resist thickness and incomplete filling of the structures can occur. As a consequence, best results will be obtained with periodic structures and periodically arranged structures as is demonstrated with imprinted metal-semiconductor-metal (MSM) patterns. (C) 2001 Elsevier Science B.V. All rights reserved.