Nanometre-scale electronics with III-V compound semiconductors

被引:1481
作者
del Alamo, Jesus A. [1 ]
机构
[1] MIT, Microsyst Technol Labs, Cambridge, MA 02139 USA
关键词
ATOMIC-LAYER-DEPOSITION; CAPACITANCE-VOLTAGE; INAS PHEMTS; TRANSISTOR; FUTURE; AL2O3; MOBILITY; MOSFETS; SIGE; GHZ;
D O I
10.1038/nature10677
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
For 50 years the exponential rise in the power of electronics has been fuelled by an increase in the density of silicon complementary metal-oxide-semiconductor (CMOS) transistors and improvements to their logic performance. But silicon transistor scaling is now reaching its limits, threatening to end the microelectronics revolution. Attention is turning to a family of materials that is well placed to address this problem: group III-V compound semiconductors. The outstanding electron transport properties of these materials might be central to the development of the first nanometre-scale logic transistors.
引用
收藏
页码:317 / 323
页数:7
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