Development of diamond films for particle detector applications

被引：46

作者：

Behnke, T

Oh, A

Wagner, A

Zeuner, W

Bluhm, A

Klages, CP

Paul, M

Schafer, L

机构：

[1] DESY, D-2000 Hamburg, Germany

[2] CERN, CH-1211 Geneva 23, Switzerland

[3] Univ Hamburg, Inst Expt Phys 2, D-2000 Hamburg, Germany

[4] Fraunhofer Inst Schicht & Oberflachentech, Braunschweig, Germany

来源：

关键词：

charge collection; CVD diamond; detector application; priming;

D O I：

10.1016/S0925-9635(98)00238-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The material properties of chemical vapour deposited (CVD) diamond, such as its high resistance against radiation, make diamond an attractive material for development of particle detectors. For such an application the charge collection properties have to be optimised. The paper reviews a study of the dependence of charge collection properties on growth parameters of a microwave plasma CVD process. The charge collection efficiency and the priming parameters of several deposition experiments are studied and correlated to growth parameters. (C) 1998 Elsevier Science S.A. All rights reserved.

引用

页码：1553 / 1557

页数：5

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