Surface potential mapping: A qualitative material contrast in SPM

被引：173

作者：

Jacobs, HO ^{[1
]}

Knapp, HF ^{[1
]}

Muller, S ^{[1
]}

Stemmer, A ^{[1
]}

机构：

[1] ETH CTR,CLA,NANOTECHNOL GRP,INST ROBOT,CH-8092 ZURICH,SWITZERLAND

来源：

ULTRAMICROSCOPY | 1997年 / 69卷 / 01期

关键词：

surface potential; contact potential; Kelvin probe; SPM; AFM; chemical contrast;

D O I：

10.1016/S0304-3991(97)00027-2

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

Electric potential measurements on different metals and semiconductors have been performed using a scanning probe microscope. The measured potential shows a clear chemical contrast in all cases, allowing us to differentiate between different materials down to 100 nm in size with potential noise smaller than 1 mV. The lateral potential resolution as a function of the tip-sample distance has been measured and numerical calculations of the force density acting on the tip are presented along with theoretical examinations of the quantitative potential resolution.

引用

页码：39 / 49

页数：11

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