Direct thermal-UV nanoimprint of an iron-containing organometallic hybrid film

被引:3
作者
Han, Huilan [1 ]
Bhushan, Abhinav [1 ]
Yaghmaie, Frank [1 ]
Davis, Cristina E. [1 ]
机构
[1] Univ Calif Davis, Dept Mech & Aerosp Engn, Davis, CA 95616 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2010年 / 28卷 / 01期
关键词
films; nanofabrication; nanolithography; nanopatterning; organic-inorganic hybrid materials; organometallic compounds; plasma materials processing; soft lithography; thermal stability; ultraviolet lithography; X-ray chemical analysis; IMPRINT LITHOGRAPHY; FABRICATION; DEVICES; ARRAYS;
D O I
10.1116/1.3271337
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
080906 [电磁信息功能材料与结构]; 082806 [农业信息与电气工程];
摘要
Direct thermal-UV nanoimprinting of an organometallic hybrid film has been demonstrated to fabricate nanoscale features into a novel organic-inorganic solution containing selected metals. The film can be patterned at low temperature and pressure, and requires only a short processing time. When analyzed by energy dispersion X-ray spectroscopy, the authors observe both organic and metal content in the final patterned features. They have also observed that film thermal stability increases after UV and oxygen plasma treatments, which may lead to devices that perform well across a wide spectrum of temperatures.
引用
收藏
页码:78 / 81
页数:4
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