Directional excitation of surface plasmons with subwavelength slits

被引:118
作者
Xu, Ting [1 ]
Zhao, Yanhui [1 ]
Gan, Dachun [1 ]
Wang, Changtao [1 ]
Du, Chunlei [1 ]
Luo, Xiangang [1 ]
机构
[1] State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
基金
中国国家自然科学基金;
关键词
D O I
10.1063/1.2894183
中图分类号
O59 [应用物理学];
学科分类号
摘要
We propose a method to manipulate the excitation direction of surface plasmons using subwavelength slits fabricated in a metallic film. By designing the specific effective index for each slit, the relative phase of plasmonics generated at the slit exit aperture can be tailored. Therefore, the electromagnetic field intensity along one direction on the metal surface can be enhanced or suppressed by surface plasmon interference. Numerical calculations performed by the finite-difference time-domain method illustrate our theoretical design. (C) 2008 American Institute of Physics.
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页数:3
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