A pulsed Grimm glow discharge as an atomic emission source

被引:41
作者
Yang, CL [1 ]
Ingeneri, K [1 ]
Harrison, WW [1 ]
机构
[1] Univ Florida, Dept Chem, Gainesville, FL 32611 USA
关键词
D O I
10.1039/a807204c
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
A high voltage, microsecond regime pulse de glow discharge was applied to a standard Grimm source on a modified LECO SA-2000 direct reader spectrometer and to a duplicate Grimm source coupled to a scanning monochromator. The effects of experimental conditions, including pulse voltage, pulse frequency, pulse width and Ar pressure, on Cu atomic and ionic emission intensities were examined and compared with continuous discharge results. The pulsed Grimm source has a higher sputtering rate, greater signal intensity and lower detection limits. The pulsed signal for atomic lines shows a different temporal response from ionic lines. Pulsed Grimm GD-AES also offers control features advantageous in the measurement of thin surface layers.
引用
收藏
页码:693 / 698
页数:6
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