Fabrication of two-dimensional arrays of CdSe pillars using e-beam lithography and electrochemical deposition

被引：58

作者：

Su, YW

Wu, CS

Chen, CC

Chen, CD ^{[1
]}

机构：

[1] Acad Sinica, Inst Phys, Taipei 11529, Taiwan

[2] Natl Taiwan Normal Univ, Dept Chem, Taipei 116, Taiwan

[3] Acad Sinica, Inst Atom & Mol Sci, Taipei, Taiwan

来源：

ADVANCED MATERIALS | 2003年 / 15卷 / 01期

关键词：

D O I：

10.1002/adma.200390008

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Two-dimensional arrays of high refractive index structures can be fabricated using a combination of e-beam lithography for pattern definition and electrochemical deposition for structure formation. The potential of this method is demonstrated for CdSe, where nanopillars, mushrooms (see Figure), walls, and crosses are prepared. Such arrays have potential in optical device applications such as photonic crystals and waveguides.

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页码：49 / +

页数：4

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