2D nano/micro hybrid patterning using soft/block copolymer lithography

被引：29

作者：

Choi, DG ^{[1
]}

Yu, HK ^{[1
]}

Yang, SM ^{[1
]}

机构：

[1] Korea Adv Inst Sci & Technol, Dept Chem & Biomol Engn, Taejon 305701, South Korea

来源：

MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS | 2004年 / 24卷 / 1-2期

关键词：

2D hybrid patterns; soft lithography; block copolymer lithography;

D O I：

10.1016/j.msec.2003.09.021

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this work, we fabricated various 2D hybrid patterns with the feature resolution from micrometer to nanometer scale by using soft lithography and block copolymer lithography. Composite molds for the high-resolution with feature sizes from 135 nm to 50 mum were composed of a hard layer supported by soft PDMS layer. Polymer (PU) replica holes were made from the composite mold by replica molding. Block copolymers (PS-b-PMMA and PS-b-PI) were used as ink materials for the pattern smaller than 100 nm. UV and ozone etching was used for the selective removal of one block in the block copolymer. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：213 / 216

页数：4

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