Performances exhibited by large area ITO layers produced by rf magnetron sputtering

被引:84
作者
Baía, I
Quintela, M
Mendes, L
Nunes, P
Martins, R
机构
[1] Univ Nova Lisboa, CEMOP, P-2825 Monte De Caparica, Portugal
[2] Univ Nova Lisboa, Fac Ciencias & Tecnol, P-2825 Monte De Caparica, Portugal
关键词
indium tin oxide; rf magnetron sputtering; annealing; reannealing;
D O I
10.1016/S0040-6090(98)01393-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This work refers to the main electro-optical characteristics exhibited by large area indium tin oxide films (300 x 400 mm) produced by r.f. magnetron sputtering under different oxygen concentrations and deposition pressures. Besides that, the ageing effect on the electro-optical characteristics of the films produced was also analyzed. The results achieved show that the film transparency and conductivity were highly improved (more than four orders of magnitude) by first annealing them in air at 470 degrees C, followed by a reannealed stage under vacuum, in a hydrogen atmosphere, at 350 degrees C. The ageing tests show that film degradation occurs when the films are produced at oxygen concentrations above 10% and/or at deposition pressures above 1.2 x 10(-2) mbar. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:171 / 175
页数:5
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