Structural and electronic properties of h-BN -: art. no. 104102

被引:359
作者
Liu, L [1 ]
Feng, YP [1 ]
Shen, ZX [1 ]
机构
[1] Natl Univ Singapore, Dept Phys, Singapore 117542, Singapore
关键词
D O I
10.1103/PhysRevB.68.104102
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Effects of stacking behavior of hexagonal basal layers to the structural stability and electronic properties of h-BN were investigated thoroughly using first-principles calculations based on the density-functional theory local-density approximation. Three of five possible h-BN structures with "good" stacking were found to be stable or substable. Considering that intrinsic stacking fault exist in real h-BN crystals which results in mixed stacking behavior, the experimentally observed large interlayer spacing of structures with stacking disorder such as PBN and t-BN can be understood. A substable structure with a direct band gap of about 3.395 eV was predicted. The existence of this substable structure and related intrinsic stacking fault in real h-BN explains the discrepancy in the nature of the band gap and the large variation in the observed band-gap values of h-BN.
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页数:8
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