Presented is a suite of microanalytical instruments for application in the fields of mechanical testing, actuator design, field emission, acceleration measurement, acoustics, optics, bipolar transistor design, and STM scanning and manipulation; all of which were fabricated using variations on two processes. Primarily the applications consist of high-aspect-ratio and bulk-micromachined single-crystal-silicon MFMs fabricated using variations on the Single Crystal Silicon Reactive Etching and Metallization process. The other set of instruments consist of surface-micromachined suspended tungsten microstructures. Highlights of the versatility that this technology offers include multiple level structure definition using the Selective Tungsten Multiple-Level Planar Process and the fabrication of self-aligned submicron aperture extraction electrodes for field emitter tips.