Deep level centers in silicon carbide: A review

被引:269
作者
Lebedev, AA [1 ]
机构
[1] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
关键词
D O I
10.1134/1.1187657
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Results from current studies of the parameters of deep centers in 6H-, 4H-, and 3C- SiC are analyzed. Data are presented on the ionization energy and capture cross sections of centers formed by doping SiC with different types of impurities or during irradiation, as well as of intrinsic defects. The involvement of these centers in radiative and nonradiative recombination is examined. This analysis of published data illustrates the large effect of intrinsic defects in the SiC crystal lattice both on the formation of deep centers and on the properties of the epitaxial layers themselves, such as their doping level and polytype homogeneity. (C) 1999 American Institute of Physics. [S1063-7826(99)00102-7].
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页码:107 / 130
页数:24
相关论文
共 205 条
[1]  
ABE K, 1997, INT C SIC 3 NITR REL, P354
[2]  
Acheson E G, 1893, CHEM NEWS, V68, P179
[3]   Deep levels of chromium in 4H-SiC [J].
Achtziger, N ;
Witthuhn, W .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1997, 46 (1-3) :333-335
[4]  
ACHTZIGER N, 1997, INT C SIC 3 NITR REL, P597
[5]  
ALAEKSEENKO AV, 1985, SOV TECH PHYS LETT, V11, P422
[6]  
Alok D, 1996, INST PHYS CONF SER, V142, P565
[7]  
Andreev A., 1994, I PHYS C SER, V137, P271
[8]  
ANDREEV AN, 1994, SEMICONDUCTORS+, V28, P430
[9]   Influence of growth conditions on the structural perfection of beta-SiC epitaxial layers fabricated on 6H-SiC substrates by vacuum sublimation [J].
Andreev, AN ;
Tregubova, AS ;
Scheglov, MP ;
Syrkin, AL ;
Chelnokov, VE .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1997, 46 (1-3) :141-146
[10]  
Andreev AN, 1996, SEMICONDUCTORS+, V30, P1074