Spatial electron density distribution in a high-power pulsed magnetron discharge

被引：106

作者：

Bohlmark, J ^{[1
]}

Gudmundsson, JT

Alami, J

Latteman, M

Helmersson, U

机构：

[1] Linkoping Univ, Dept Phys & Measurement Technol, IFM, Plasma Coatings Phys Div, SE-58183 Linkoping, Sweden

[2] Univ Iceland, Dept Elect & Comp Engn, IS-107 Reykjavik, Iceland

[3] Univ Iceland, Inst Sci, IS-107 Reykjavik, Iceland

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2005年 / 33卷 / 02期

关键词：

magnetron sputtering; plasma density; pulsed plasmas; thin film deposition;

D O I：

10.1109/TPS.2005.845022

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The spatial electron density distribution was measured as function of time in a high-power pulsed magnetron discharge. A Langmuir probe was positioned in various positions below the target and the electron density was mapped out. We recorded peak electron densities exceeding 10(19) m(-3) in a close vicinity of the target. The dynamics of the discharge showed a dense plasma expanding from the "race-track" axially into the vacuum chamber. We also record electrons trapped in a magnetic bottle where the magnetron magnetic field is zero, formed due to the unbalanced magnetron.

引用

页码：346 / 347

页数：2

共 6 条

[1] Influence of high power densities on the composition of pulsed magnetron plasmas [J].