共 28 条
[5]
FUJITA M, 2000, APPL PHYS LETT, V77, P1937
[9]
Characteristics of very high-aspect-ratio contact hole etching
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1997, 36 (4B)
:2470-2476
[10]
Imada M, 2002, J LIGHTWAVE TECHNOL, V20, P845