Optical design of the U7 undulator beamline at the Pohang Light Source

被引:11
作者
Shin, HJ [1 ]
Chung, Y [1 ]
Kim, B [1 ]
机构
[1] POSTECH, Pohang Accelerator Lab, Beamline Res Div, Pohang 790784, South Korea
关键词
beamline design; undulator beamlines; plane-grating monochromators;
D O I
10.1107/S0909049597016142
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The first insertion-device beamline at the Pohang Light Source is designed for high-resolution spectroscopy and spectromicroscopy. The beamline will contain a variable-included-angle plane-grating monochromator (VIA-PGM) using a grating substrate which has seven different grooves with different depths. The advantages of this scheme will be the fixed exit-slit position and the mechanical stability of the grating scan mechanism while changing the photon energy range. The beamline is designed to cover the photon energy range 20-2000 eV. The estimated spectral resolution, E/Delta E, is above 8000 in the photon energy range below 500 eV, and above 4000 for the remaining photon energy range. The estimated Bur at the end-station is of the order of 10(12) photons s(-1) (0.1% bandwidth)(-1).
引用
收藏
页码:648 / 650
页数:3
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