Near-field intensity correlations in semicontinuous metal-dielectric films

被引：47

作者：

Seal, K ^{[1
]}

Sarychev, AK

Noh, H

Genov, DA

Yamilov, A

Shalaev, VM

Ying, ZC

Cao, H

机构：

[1] Northwestern Univ, Dept Phys & Astron, Evanston, IL 60208 USA

[2] Ethertron Inc, San Diego, CA 92121 USA

[3] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA

[4] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA

来源：

PHYSICAL REVIEW LETTERS | 2005年 / 94卷 / 22期

关键词：

D O I：

10.1103/PhysRevLett.94.226101

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Spatial intensity correlation functions are obtained from near-field scanning optical microscope measurements of semicontinuous metal-dielectric films. The concentration of metal particles on a dielectric surface is varied over a wide range to control the scattering strength. At low and high metal coverages where scattering is weak, the intensity correlation functions exhibit oscillations in the direction of incident light due to excitation of propagating surface waves. In the intermediate regime of metal concentration, the oscillatory behavior is replaced by a monotonic decay as a result of strong scattering and anomalous absorption. Significant differences in the near-field intensity correlations between metallic and dielectric random systems are demonstrated.

引用

页数：4

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