Structural, optical and electrochromic properties of nickel oxide thin films grown from electrodeposited nickel sulphide

被引：82

作者：

Uplane, M. M. ^{[1
]}

Mujawar, S. H. ^{[1
]}

Inamdar, A. I. ^{[1
]}

Shinde, P. S. ^{[1
]}

Sonavane, A. C. ^{[1
]}

Patil, P. S. ^{[1
]}

机构：

[1] Shivaji Univ, Dept Phys, Film Mat Lab, Kolhapur 416004, Maharashtra, India

来源：

APPLIED SURFACE SCIENCE | 2007年 / 253卷 / 24期

关键词：

nickel oxide thin films; electrochemical properties (CV; CC); scanning electron microscopy; XRD; optical properties;

D O I：

10.1016/j.apsusc.2007.05.069

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Nickel oxide thin films were grown onto FTO-coated glass substrates by a two-step process: electrodeposition of nickel sulphide and their thermal oxidation at 425, 475 and 525 degrees C. The influence of thermal oxidation temperature on structural, optical, morphological and electrochromic properties was studied. The structural properties undoubtedly revealed NiO formation. The electrochromic properties were studied by means of cyclic voltammetry. The films exhibited anodic electrochromism, changing from a transparent state to a coloured state at +0.75 V versus SCE, i.e. by simultaneous ion and electron ejection. The transmittance in the coloured and bleached states was recorded to access electrochromic quality of the films. Colouration efficiency and electrochromic reversibility were found to be maximum (21 mC/cm(2) and 89%, respectively) for the films oxidized at 425 degrees C. The optical band gap energy of nickel oxide slightly varies with increase in annealing temperature. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：9365 / 9371

页数：7

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