Epitaxial metal/insulator superlattices of Ti-Ag/MgO grown on MgO(001) substrates

被引：2

作者：

Kado, T

Tamai, H

机构：

[1] MITI, Chugoku Natl Ind Res Inst, Hiroshima 73701, Japan

[2] Tottori Prefectural Ind Res Inst, Yonago, Tottori 683, Japan

来源：

THIN SOLID FILMS | 1998年 / 317卷 / 1-2期

关键词：

metal/insulator multilayers; electron beam evaporation; reflection high energy diffraction; X-ray diffraction; transmission electron microscopic measurements;

D O I：

10.1016/S0040-6090(97)00640-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Metal/insulator multilayers composed of Ti1-xAgx alloy (0 less than or equal to x less than or equal to 1) and MgO were prepared on MgO(001) substrates at 273 K by electron beam evaporation in ultrahigh vacuum. Reflection high-energy electron diffraction, X-ray diffraction and transmission electron microscopic measurements revealed that Ti0.97Ag0.03/MgO and Ti/MgO multilayers were epitaxially grown superlattices. It was found that the crystal structures of the metals (Ti0.97Ag0.03, Ti) in the superlattices were tetragonal. (C) 1998 Elsevier Science S.A.

引用

页码：249 / 254

页数：6

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