Single-electron manpulation to and from SiO2 surface by electrostatic force microscopy -: art. no. 163109

被引:16
作者
Bussmann, E [1 ]
Zheng, N [1 ]
Williams, CC [1 ]
机构
[1] Univ Utah, Dept Phys, Salt Lake City, UT 84112 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.1897429
中图分类号
O59 [应用物理学];
学科分类号
摘要
Occupation of individual electron states near the surface of a SiO2 film is controlled by reversible single-electron tunneling to or from a metallic electrostatic force microscope probe. By switching the polarity of an applied dc bias between the probe and the sample to adjust the Fermi energy of the probe with respect to states near the dielectric surface, individual electrons are repeatably manipulated in and out of the sample. The single-electron charging and discharging is detected by frequency detection electrostatic force microscopy. 2005 American Institute of Physics.
引用
收藏
页码:1 / 3
页数:3
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