Nonlinear magnetoelastic anisotropy in Cu/Ni/Cu/Si(001) films

被引：53

作者：

Ha, K ^{[1
]}

O'Handley, RC ^{[1
]}

机构：

[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1999年 / 85卷 / 08期

关键词：

D O I：

10.1063/1.369855

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A spin-pair model including magnetoelastic terms to second order in strain is used to analyze the magnetic anisotropy of epitaxial Cu/Ni/Cu/Si(001) films. Two adjustable parameters are used to fit the magnetic anisotropy data taken by a torque magnetometer. It is found that the nonlinear bulk magnetoelastic term can contribute up to about 40% of the total anisotropy energy for thinner nickel films. (C) 1999 American Institute of Physics. [S0021-8979(99)65408-1].

引用

页码：5282 / 5284

页数：3

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