High pressure-high temperature investigation of the stability of nitride spinels in the systems Si3N4-Ge3N4

被引:23
作者
Soignard, E
Somayazulu, M
Mao, HK
Dong, JJ
Sankey, OF
McMillan, PF
机构
[1] UCL Royal Inst Great Britain, London W1S 4BS, England
[2] UCL, Dept Chem, Christopher Ingold Labs, London WC1H 0AJ, England
[3] Geophys Lab, Washington, DC 20015 USA
[4] Auburn Univ, Dept Phys, Auburn, AL 36849 USA
[5] Arizona State Univ, Dept Phys & Astron, Tempe, AZ 85287 USA
关键词
X-ray scattering; chemical synthesis; crystal structure and symmetry;
D O I
10.1016/S0038-1098(01)00379-9
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this study, we used laser-heated diamond anvil cell techniques coupled with synchrotron X-ray diffraction to investigate the synthesis and stability of nitride spinels in the Si3N4-Ge3N4 system, at pressures close to 20 GPa and at temperatures up to > 2000 degreesC. The newly discovered nitride spinels were found to be stable over the entire pressure and temperature range studied. There is little incorporation Of Si3N4 component in gamma -Ge3N4, but we observed formation of a new ternary nitride spinel (SixGe1-x)(3)N-4, with x similar to 0.6. The analysis of the X-ray patterns indicates that Si4+, normally considered to be the smaller ion, is strongly partitioned into the octahedral sites in the spinel phase. Excess Ge4+ ions may also occupy these octahedral sites in the experimental synthesis at high pressure and temperature. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:237 / 242
页数:6
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