Magnetic coupling in sputtered Fe/Si-type multilayers

被引：38

作者：

Kohlhepp, J ^{[1
]}

denBroeder, FJA ^{[1
]}

机构：

[1] EINDHOVEN UNIV TECHNOL,DEPT PHYS,5600 MB EINDHOVEN,NETHERLANDS

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1996年 / 156卷 / 1-3期

关键词：

D O I：

10.1016/0304-8853(95)00861-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In HV-sputtered Fe100-xSix/Si100-yFey multilayers the antiferromagnetic coupling strength and the fraction of ferromagnetic coupling increases with decreasing temperature. The ferromagnetic component can be explained by bridging along grain boundaries or by an Fe percolation mechanism in the nonmagnetic interlayers. Recent speculations that the magnetic coupling across the FeSi spacers is mediated by thermal excitation of charge carriers are incompatible with our observations.

引用

页码：261 / 262

页数：2

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