Angle-resolved XPS study of plasma-deposited polystyrene films after oxygen plasma treatment

被引：24

作者：

Haidopoulos, Marie ^{[1
]}

Horgnies, Matthieu ^{[2
]}

Mirabella, Frederic ^{[1
]}

Pireaux, Jean-Jacques ^{[1
]}

机构：

[1] Fac Univ Notre Dame Paix, Lab Interdisciplinaire Spect Elect, B-5000 Namur, Belgium

[2] Catholic Univ Louvain, Unite Chim Interfaces, B-1348 Louvain, Belgium

来源：

PLASMA PROCESSES AND POLYMERS | 2008年 / 5卷 / 01期

关键词：

ageing; ARXPS; oxidation; polystyrene; water contact angles (WCA);

D O I：

10.1002/ppap.200700067

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Plasma oxidation of plasma deposited polystyrene (pPS) films was performed in an inductively coupled plasma reactor. Reconstruction of the oxygen concentration depth profiles based on angle-resolved XPS data showed that two competitive mechanisms (functionalization and etching) happened during the oxygen plasma treatment. Static water contact angle measurements confirmed this result. Oxidized pPS films were also not stable with time; a loss of hydrophilicity was observed and reorganization of the topmost functionalized surface occurred involving diffusion of oxygen groups from the surface towards the bulk and re-contamination by reaction of trapped radicals with hydrocarbon molecules present in ambient air.

引用

页码：67 / 75

页数：9

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