The gas-sensing properties of WO3-x thin films deposited via the atmospheric pressure chemical vapour deposition (APCVD) of WCl6 with ethanol

被引：25

作者：

Ashraf, Sobia ^{[1
]}

Blackman, Christopher S. ^{[1
]}

Naisbitt, Simon C. ^{[1
]}

Parkin, Ivan P. ^{[1
]}

机构：

[1] UCL, Dept Chem, London WC1H 0AJ, England

来源：

MEASUREMENT SCIENCE AND TECHNOLOGY | 2008年 / 19卷 / 02期

关键词：

CVD; tungsten oxide;

D O I：

10.1088/0957-0233/19/2/025203

中图分类号：

T [工业技术];

学科分类号：

08 [工学];

摘要：

The use of the APCVD reaction of WCl6 with ethanol to produce tungsten oxide films (3600-6700 nm thick) for use as gas sensors is presented. The response of these films to varying concentrations of ethanol and NO2 at varying temperatures has been examined. A comparison of the CVD sensors to a thick film (similar to 60 mu m) screen-printed sensor has shown that the CVD sensors have a faster rate of response, a stable sensing response and faster return to baseline with no drift at the conditions examined.

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页数：9

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