Voltage dependence of magnetoresistance in spin dependent tunneling junctions

被引:143
作者
Zhang, J [1 ]
White, RM [1 ]
机构
[1] Carnegie Mellon Univ, Dept Elect & Comp Engn, Data Storage Syst Ctr, Pittsburgh, PA 15213 USA
关键词
D O I
10.1063/1.367644
中图分类号
O59 [应用物理学];
学科分类号
摘要
The voltage dependence of magnetoresistance in spin dependent tunneling (SDT) junctions was studied experimentally and theoretically. Different magnetoresistance (MR)-V dependence in various patterned junctions was observed and correlated with other technologically important parameters, including the magnitude of the MR, linearity of the current-voltage characteristic, temperature dependence of the junction resistance, and the MR. A phenomenological model based on a spin-independent two-step tunneling via defect states in the barrier, in addition to the spin-dependent direct tunneling, is proposed to account for the MR-V dependence. The MR ratio is determined by the ratio of the two currents. The MR-V dependence results from a stronger voltage dependence of the two-step tunneling current compared to that of the direct tunneling current. The same model also satisfactorily predicts other properties of SDT junctions. A high quality barrier is required to minimize the MR-V dependence and improve other junction properties. The approach to achieving desirable junction impedance for data storage applications is discussed. (C) 1998 American Institute of Physics. [S0021-8979(98)28311-3].
引用
收藏
页码:6512 / 6514
页数:3
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