Amorphous diamond films deposited by pulsed laser ablation: The optimum carbon-ion kinetic energy and effects of laser wavelength

被引:27
作者
Lowndes, DH [1 ]
Merkulov, VI [1 ]
Puretzky, AA [1 ]
Geohegan, DB [1 ]
Jellison, GE [1 ]
Rouleau, CM [1 ]
Thundat, T [1 ]
机构
[1] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA
来源
ADVANCES IN LASER ABLATION OF MATERIALS | 1998年 / 526卷
关键词
D O I
10.1557/PROC-526-325
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A systematic study has been made of changes in the banding and optical properties of hydrogen-free tetrahedral amorphous carbon (ta-C) films, as a function of the kinetic energy of the incident carbon ions measured under film-deposition conditions. Ion probe measurements of the carbon ion kinetic energies produced by ArF and KrF laser ablation of graphite are compared under identical beam-focusing conditions. Much higher C+ kinetic energies are produced by ArF-laser ablation than by KrF for any given fluence and spot size. Electron energy loss spectroscopy and scanning ellipsometry measurements of the sp(3) bonding fraction, plasmon energy, and optical properties reveal a well-defined optimum kinetic energy of 90 eV to deposit ta-C films having the largest sp(3) fraction and the widest optical (Tauc) energy gap (equivalent to minimum near-gap optical absorption). Tapping-mode atomic force microscope measurements show that films deposited at near-optimum kinetic energy are extremely smooth, with rms roughness of only similar to 1 Angstrom over distances of several hundred nm, and are relatively free of particulates.
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页码:325 / 330
页数:6
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